You are here

David Dunston Graduates from the Leadership Center for Excellence’s Young Professionals Program

Jan 2017
From left to right, Rich Krock, Susan Wade, David Dunston and Dick Doyle

We’d like to congratulate our VI colleague, David Dunston, on successfully completing the Leadership Center for Excellence’s Young Professionals Program, which invests in high-potential leaders in the DC metropolitan area. This program provides an opportunity to develop new professional skills and capacities, while also acquiring the tools, visibility and network necessary to engage in their broader community.

David was selected as one of 30 participants in the 2016 Fall program, during which, he attended class sessions twice a month and engaged in many of the Leadership Center for Excellence events where he developed many business relationships with peers and community leaders, met a variety of business mentors and engaged in community service projects.

A reception and graduation ceremony for the 2016 Fall participants was held at Mary Mount University, in Arlington, VA. The keynote address was given by Greg Hamilton, publisher and co-founder of Arlington Magazine.

Hamilton encouraged the graduating group to make their own luck by working hard, putting forth a concerted effort and being kind. By doing so, they will  recognize and capitalize on opportunities throughout their lives.  

Congraulations David! We are so proud of all you've accomplished in your nearly two years with the Vinyl Institute. It is a pleasure and an honor to work with such a bright, thoughtful and focused team member.

David Dunston, Jr. Oct 2017

At 2017 Vinyltec, Student Kyle Kilponen Gains a New Perspective on Vinyl and Sustainability

VI Travel Grant recipient and Michigan State University senior Kyle Kilponen gained a new perspective on vinyl and sustainability at the 2017 Vinyltec.

David Dunston, Jr. Sep 2017

The Vinyl Institute Is Sending Three Students to Vinyltec

The Vinyl Institute has selected 3 amazing students to attend 2017 Vinyltec.